Lace Lithography seeks a researcher to advance resist chemistry simulations for next‑gen chip lithography. You will bridge Resist Chemistry and Mask Optimization, translating computational models into real‑world constraints.
PhD or equivalent in applied physics or materials science is preferred, with 2+ years in lithography R&D. Strong coding in Python/ Julia and collaboration with experimental teams are essential. Relocation support and global team access available.
#J-18808-Ljbffr