Micron Technology, Inc. in Boise, ID, is seeking an EUV Mask Technology R&D Engineer to advance High‑NA EUV readiness and develop mask materials and processes.
You will work with cross‑functional teams, perform data‑driven DOE studies, and translate lithography requirements into manufacturable mask solutions for next‑gen DRAM scaling.
Preferred candidates hold an MS/PhD in a related field with 2+ years in semiconductor research or manufacturing and are familiar with EUV/BEOL/FEOL processes.
#J-18808-LjbffrEUV Mask R&D Engineer — AI-Assisted High-NA Readiness in boise at Unknown Company
This position is listed as full time and onsite.